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Miniature magnetron sputtering coating machine

This device features an integrated desktop design that combines a mechanical pump with a pre-stage pipeline, eliminating the need for external complex tubing. It is equipped with 1-2 2-inch magnetron targets and supports DC/RF power switching. The system offers real-time film thickness monitoring, fine-tuning of the inflation valve, and safety interlock protection, making it suitable for rapid preparation and teaching demonstrations of metal, oxide, and semiconductor thin films.

Details

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1. Overview of Equipment and Application Fields

The compact magnetron sputtering coating system is a desktop vacuum coating device specifically designed for space-constrained laboratories, university teaching demonstrations, and early-stage R&D teams. It integrates vacuum acquisition, gas control, power supply systems, and film thickness monitoring into a single unit, offering notable advantages such as compact size, lightweight design, and user-friendly operation. This equipment is widely used in the preparation of nanoscale single-layer films, multilayer films, metallic conductive films, optical dielectric films, and semiconductor thin films, serving as an ideal tool for fundamental material science research and teaching experiments.

2. Core Functional Highlights

· Compact integrated design features a fully enclosed desktop structure with built-in high-performance mechanical vacuum pump and vacuum measurement gauge, eliminating the need for external bulky pump units or complex vacuum pipelines. The equipment occupies minimal floor space and can be directly placed on standard laboratory workbenches, achieving plug-and-play functionality.

· Flexible target configuration: Depending on the model, one or two 2-inch permanent magnet magnetron sputtering targets can be configured. Supports **DC and RF** power mode switching (RF power supply is optional), capable of depositing both metallic targets and non-metallic targets such as oxides and nitrides.

· Precision Film Thickness Monitoring: Equipped with a high-sensitivity quartz crystal oscillator film thickness meter, it provides real-time monitoring of deposition rate and film thickness with an accuracy of angstrom (Å) level. Users can preset target thickness values, and the system automatically closes the shutter or power supply upon reaching the set value, ensuring the precision and repeatability of experimental data.

· The simplified pneumatic control system integrates a manual fine-tuning inflation valve, enabling precise introduction of working gases such as argon and reaction gases (e.g., oxygen, nitrogen). With vacuum gauge readings, users can easily adjust and maintain stable working gas pressure to meet the requirements of reactive sputtering processes.

· The all-round safety protection device features a comprehensive interlocking protection mechanism:

o Power failure protection: automatically cuts off high-voltage power and maintains vacuum state during unexpected power loss.

o Water-cooling protection: monitors the cooling water flow of the target material and automatically cuts off the power supply when water is interrupted to prevent overheating damage.

o Overcurrent protection: automatically trips when the power output is abnormal, ensuring the safety of equipment and personnel.

3. Technical Parameters and Specifications

Parameter item

qualification

device type

DESK TYPE/DESK STATIONARY MINI-MAGNETRON SPUTTERING APPARATUS

vacuum chamber material

Stainless steel or high-strength acrylic visual cavity (optional)

final vacuum

5×10⁻⁴ Pa (with mechanical pump)

working vacuum

0.5 to 10 Pa (adjustable)

magnetron target configuration

1 or 2 2-inch planar magnetron targets

target cooling

circulating water cooling system (with flow protection switch)

Power mode

DC standard configuration / RF optional configuration

film thickness monitoring

Quartz crystal thickness gauge, range 0-999,999 A, accuracy ±1%

Sample holder

Fixed or simple rotating sample stage (diameter 100mm)

airway system

1-2 manual fine-tuning intake valves, with vacuum gauge display

power requirement

AC 220V ±10%,50Hz, power <1kW

outline dimension

Approximately 600mm × 400mm × 500mm (depending on the model)

weight

<50kg, easy to move and transport

4. Typical Application Scenarios

· The experiment of vacuum technology in university is suitable for the demonstration of vacuum technology course and the hands-on experiment of students.

· Pre-research and pilot-scale testing: Used for rapid screening of new material formulations, preliminary exploration of process parameters, and thin film preparation of small-scale samples (e.g., chips, substrates).

· Enterprise R&D Lab: A pre-production validation platform for large-scale manufacturing equipment, it reduces R&D costs and shortens development cycles.

· Micro/nano fabrication supplement: For cleanroom facilities with limited space, we provide convenient metal electrode deposition or protective coating services.

5. Why choose a compact magnetron sputtering system?

The compact magnetron sputtering system lowers the technical barrier for vacuum coating with its exceptional cost-effectiveness and intuitive operation. Designed for non-specialist use, it requires only basic training for independent operation by researchers. Its space-saving design not only conserves laboratory space but also delivers reliable performance, establishing itself as an indispensable entry-level tool in nanofilm research. This system accelerates the translation of scientific ideas into experimental achievements.